Wojciech Kijaszek, PhD
Email: wojciech.kijaszek@pwr.edu.pl
Unit: Faculty of Electronics, Photonics and Microsystems (N) » Department of Microelectronics and Nanotechnology
ul. Janiszewskiego 11/17, 50-372 Wrocław
building C-2, room 206
phone +48 71 320 2565
Office hours
Research fields
- Deposition and etching of thin films by glow discharge plasma enhanced methods; technology of Diamond-like Carbon films; characterization of optical properties of dielectric films.
Recent papers
2017
- Wiatrowski A., Kijaszek W., Posadowski W., Oleszkiewicz W., Jadczak J., Kunicki P., Deposition of diamond-like carbon thin films by the high power impulse magnetron sputtering method, Diamond and Related Materials, vol. 72 (2017), s. 71-76.
2016
- Kijaszek W., Oleszkiewicz W., Zakrzewski A., Patela S., Tłaczała M., Investigation of optical properties of silicon oxynitride films deposited by RF PECVD method, Materials Science-Poland, vol. 34, nr 4 (2016), s. 868-871.
- Kijaszek W., Oleszkiewicz W., Optimization of radio frequency inductively coupled plasma enhanced chemical vapour deposition process of diamond-like carbon films, Optica Applicata, vol. 46, nr 2 (2016), s. 167-172.
2013
- Oleszkiewicz W., Markowski J., Srnánek R., Kijaszek W., Gryglewicz J., Kováč J., Tłaczała M., Influence of RF ICP PECVD process parameters of diamond-like carbon films on DC bias and optical emission spectra, Optica Applicata, vol. 43, nr 1 (2013), s. 109-115.
